Introduction to integrated circuit technology, Production of E-beam masks. Introduction, VLSI technologies, MOS transistors, fabrication, thermal aspects, production of E-beam masks.
Rain to source current Ids versus Vds relationships-BICMOS latch up susceptibility. MOS transistor characteristics, figure of merit, pass transistor NMOS and COMS inverters, circuit model, latch up.
Mass layers, strick diagrams, design, symbolic diagrams
Sheet resistance, capacitance layer inverter delays, wiring capacitance, choice of layers.
Scaling model and scaling factors- Limit due to current density.
Some architecture issues- other systems considerations. Examples of structural design, clocked sequential circuits
Some general considerations, an Illustration of design process, observations
Observation on the design process, Regularity Design of an ALU subsystem. Design of 4-bit adder, implementing ALU functions.